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On‐Site Fabrication of Crystalline Cerium Oxide Films and Patterns by Ink‐Jet Deposition Method at Moderate Temperatures
Author(s) -
Gallage Ruwan,
Matsuo Atsushi,
Fujiwara Takeshi,
Watanabe Tomoaki,
Matsushita Nobuhiro,
Yoshimura Masahiro
Publication year - 2008
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2008.02402.x
Subject(s) - materials science , crystallite , scanning electron microscope , fabrication , substrate (aquarium) , nanometre , etching (microfabrication) , cerium oxide , chemical engineering , deposition (geology) , phase (matter) , thin film , diffraction , oxide , nanotechnology , composite material , optics , metallurgy , chemistry , layer (electronics) , alternative medicine , oceanography , pathology , engineering , biology , paleontology , medicine , physics , organic chemistry , sediment , geology
Crystalline CeO 2 films and patterns have been successfully fabricated in a “single‐step process” at moderate temperature. In this process, the combination of the ink‐jet technique and depositing the precursor on a hot substrate (≤300°C) gave crystalline CeO 2 without further heat treatment. X‐ray diffraction analysis revealed that the phase formed was crystallized ceria with nanosized (<10 nm) crystallites. The film thickness was several hundred nanometers and the pattern width was about 150 μm. Scanning electron microscopy analysis showed that the films and patterns were free of cracks and adhered to the substrate. This is the first report about the direct patterning of crystalline CeO 2 without postfiring or posttreatments like masking, etching, etc.