Premium
Solubility Limits of La and Y in Aluminum Oxynitride at 1870°C
Author(s) -
Miller Lior,
Kaplan Wayne D.
Publication year - 2008
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2008.02323.x
Subject(s) - solubility , scanning electron microscope , dopant , analytical chemistry (journal) , materials science , detection limit , isotropic etching , chemistry , nuclear chemistry , mineralogy , etching (microfabrication) , doping , chromatography , nanotechnology , composite material , optoelectronics , layer (electronics)
The solubility limits of important dopants (La and Y) in aluminum oxynitride (AlON) were measured using wavelength‐dispersive spectroscopy (WDS) mounted on a scanning electron microscope, from samples quickly cooled from 1870°C. To provide saturated AlON, samples were prepared with dopant concentrations well above the solubility limit, which was confirmed by the appearance of secondary phases using X‐ray diffraction, backscattered electron micrographs, and WDS. Measurements were conducted on polished samples without thermal or chemical etching. The results indicate solubility limits of 498±82 and 1775±128 ppm for La and Y in AlON at 1870°C, respectively. The solubility limit of Mg in AlON at 1870°C was found to be >4000 ppm. The relation between solubility limit and cation size is briefly discussed.