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Deposition Mechanism for Chemical Vapor Deposition of Zirconium Carbide Coatings
Author(s) -
Wang Yiguang,
Liu Qiaomu,
Liu Jinling,
Zhang Litong,
Cheng Laifei
Publication year - 2008
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2007.02253.x
Subject(s) - zirconium carbide , zirconium , chemical vapor deposition , materials science , deposition (geology) , carbon fibers , carbide , coating , chemical engineering , metallurgy , composite material , nanotechnology , composite number , paleontology , sediment , engineering , biology
Zirconium carbide (ZrC) coatings were fabricated by chemical vapor deposition (CVD) using ZrCl 4 , CH 4 /C 3 H 6 , and H 2 as precursors. Both thermodynamic calculation results and the film compositions at different temperatures indicated that zirconium and carbon deposited separately during the CVD process. The ZrC deposition rates were measured for CH 4 or C 3 H 6 as carbon sources at different temperatures based on coating thickness. The activation energies for ZrC deposition demonstrated that the CVD ZrC process is controlled by the carbon deposition. This is also proven by the morphologies of ZrC coatings.