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Plasma‐Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process
Author(s) -
Iwasawa Junichi,
Nishimizu Ryoichi,
Tokita Masahiro,
Kiyohara Masakatsu,
Uematsu Keizo
Publication year - 2007
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2007.01738.x
Subject(s) - materials science , quartz , yttrium , crystallite , layer (electronics) , substrate (aquarium) , composite material , surface roughness , transmittance , deposition (geology) , thin film , transmission electron microscopy , oxide , analytical chemistry (journal) , mineralogy , chemical engineering , metallurgy , nanotechnology , optoelectronics , chemistry , paleontology , oceanography , chromatography , sediment , biology , geology , engineering
Dense yttrium oxide film was prepared on a quartz substrate by the aerosol deposition process at the room temperature. The deposition rate was very high, 60 m/h. Thick film of 10 m was easily achievable on the quartz substrate. Transmission electron microscopy showed that the film was highly dense without voids and was composed of randomly oriented Y 2 O 3 crystallites of sizes smaller than 20 nm. The interface between the film layer and the quartz substrate was homogeneous. The film (2‐m thick) had a high transmittance (55–85%) in the wavelength region of 250‐800 nm. The mechanical properties of the film were very good. The adhesion force of the interface between the Y 2 O 3 layer and the quartz substrate was over 80 MPa. The Vickers hardness of the film was 7.7 GPa. The film also had an excellent plasma resistance in a gas mixture of CF 4 /O 2 . Outstanding results were noted in eroded depth, surface roughness, nanostructure, and transmittance change after plasma exposure of the film.