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Nitridation of Silica to an α‐Silicon Nitride Nanorod Using NaNH 2 in the Autoclave at 700°C
Author(s) -
Zhu Lingling,
Chen Luyang,
Huang Tao,
Qian Yitai,
Gu Yunle
Publication year - 2007
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2007.01411.x
Subject(s) - nanorod , materials science , analytical chemistry (journal) , transmission electron microscopy , nitride , x ray photoelectron spectroscopy , nitriding , silicon , silicon nitride , chemical engineering , nanotechnology , chemistry , optoelectronics , layer (electronics) , chromatography , engineering
α‐silicon nitride nanorods have been synthesized through solid‐state reduction–nitridation of silica using NaNH 2 as both a reductant and a nitriding reagent. X‐ray powder diffraction patterns show that the products have a hexagonal phase with lattice parameters a =7.767 Å and c =5.630 Å. Transmission electron microscopy reveals that the as‐synthesized products are pure nanorods with an average size about 30 nm in diameter and 400 nm in length. X‐ray photoelectron spectra indicate that the molar ratio of Si/N is 2.988:4. Fourier‐transform infrared spectrum yields a strong Si–N absorption at 926 cm −1 that may be a red shift due to size effect.