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Evaporation‐Induced Self‐Assembly of Amino‐Functionalized Mesoporous Silica Thin Films by Sol–Gel Process
Author(s) -
Zhang Xueao,
Wu Wenjian,
Wang Jianfang,
Liu Changli
Publication year - 2007
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2006.01477.x
Subject(s) - mesoporous organosilica , materials science , mesoporous material , chemical engineering , thermogravimetric analysis , microporous material , ammonium bromide , specific surface area , adsorption , thin film , mesoporous silica , nanotechnology , pulmonary surfactant , composite material , organic chemistry , catalysis , chemistry , engineering
Microporous and mesoporous materials have found great utility as catalysts and adsorption media because of their large internal surface area. Since the discovery of surfactant‐templated mesoporous silica materials in 1992, the new developing periodic mesoporous organosilica material (PMO) has received much attention. In this present work, a PMO material, amino‐functionalized mesoporous silica thin films with 3D hexagonal structure, were synthesized by self‐assembly co‐condensation of tetraethoxy silane (TEOS) and 3‐aminopropyltriethoxysiliane (APTES) precursors in various ratios, in the presence of cetyltrimethyl ammonium bromide acting as the structure‐directing agent. The thin films were characterized by small‐angle X‐ray diffraction, grazing incidence small angle X‐ray scattering, Fourier transform infrared, transmission electron microscope, thermogravimetric analysis, and N 2 adsorption. Results show that when the APTES/(TEOS+APTES) ratio was 0.10, the mesoporous organosilica thin film has high degree of order, an average pore size of 2.16 nm, a large BET‐specific surface area of 1560 m 2 /g and a large pore volume of 0.76 cm 3 /g.