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Zero Thermal Expansion in (Al 2 x (HfMg) 1− x )(WO 4 ) 3
Author(s) -
Suzuki Tomoko,
Omote Atsushi
Publication year - 2006
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2005.00729.x
Subject(s) - thermal expansion , materials science , ceramic , thermal , atmospheric temperature range , negative thermal expansion , phase (matter) , composite material , mineralogy , analytical chemistry (journal) , thermodynamics , physics , chemistry , chromatography , quantum mechanics
Low‐thermal‐expansion materials in a wide temperature range are expected to be used in electronic devices, optical devices, and nanoscale devices. The authors have tried to fabricate a single‐phase zero‐thermal‐expansion material. A new single‐phase ceramic material, (Al 2 x (HfMg) 1− x )(WO 4 ) 3 , could be produced from a mixture of a negative‐thermal‐expansion material, (HfMg)(WO 4 ) 3 , and a positive‐thermal‐expansion material, Al 2 (WO 4 ) 3 . At x =0.15 this material shows nearly zero thermal expansion from room temperature to 800°C.