Zero Thermal Expansion in (Al 2 x  (HfMg) 1− x  )(WO 4 ) 3 | Zendy

Suzuki Tomoko | Zendy; Omote Atsushi | Zendy

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Zero Thermal Expansion in (Al 2 x (HfMg) 1− x )(WO 4 ) 3

Author(s) -

Suzuki Tomoko,

Omote Atsushi

Publication year - 2006

Publication title -

journal of the american ceramic society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.9

H-Index - 196

eISSN - 1551-2916

pISSN - 0002-7820

DOI - 10.1111/j.1551-2916.2005.00729.x

Subject(s) - thermal expansion , materials science , ceramic , thermal , atmospheric temperature range , negative thermal expansion , phase (matter) , composite material , mineralogy , analytical chemistry (journal) , thermodynamics , physics , chemistry , chromatography , quantum mechanics

Low‐thermal‐expansion materials in a wide temperature range are expected to be used in electronic devices, optical devices, and nanoscale devices. The authors have tried to fabricate a single‐phase zero‐thermal‐expansion material. A new single‐phase ceramic material, (Al 2 x (HfMg) 1− x )(WO 4 ) 3 , could be produced from a mixture of a negative‐thermal‐expansion material, (HfMg)(WO 4 ) 3 , and a positive‐thermal‐expansion material, Al 2 (WO 4 ) 3 . At x =0.15 this material shows nearly zero thermal expansion from room temperature to 800°C.

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