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Oxidation of Polymer‐Derived SiAlCN Ceramics
Author(s) -
Wang Yiguang,
An Linan,
Fan Yi,
Zhang Ligong,
Burton Sarah,
Gan Zhehong
Publication year - 2005
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2005.00542.x
Subject(s) - annealing (glass) , oxide , amorphous solid , oxygen , chemical vapor deposition , materials science , kinetics , ceramic , polymer , atmospheric temperature range , chemical engineering , chemistry , analytical chemistry (journal) , crystallography , nanotechnology , thermodynamics , metallurgy , composite material , physics , organic chemistry , chromatography , quantum mechanics , engineering
The oxidation behavior of polymer‐derived amorphous SiAlCNs was studied in the temperature range of 900°–1200°C. The results revealed that while at 900°C the oxidation of the SiAlCNs follows typical parabolic kinetics, at higher temperatures the oxidation rates of the materials decrease with annealing time. Long‐term oxidation rate of the SiAlCNs is much lower than the lowest values reported for chemical vapor deposition of SiC and Si 3 N 4 . Structures of the oxide scales were studied using solid‐state nuclear magnetic resonance. We proposed that oxide scales formed for the SiAlCNs possess a unique network structure of the oxide scale in which aluminum atoms block the path of oxygen diffusion, thus lowering the oxidation rates. Such a unique structure was likely formed gradually with annealing time, leading to a continuous decrease in oxidation rate.