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Preparation and Corrosion Resistance of Amorphous SiN x Films from Hexamethyldisiloxane Solution by PECVD
Author(s) -
Li Y. S.,
Shimada S.
Publication year - 2005
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2005.00531.x
Subject(s) - hexamethyldisiloxane , amorphous solid , materials science , plasma enhanced chemical vapor deposition , corrosion , scanning electron microscope , chemical vapor deposition , x ray photoelectron spectroscopy , substrate (aquarium) , transmission electron microscopy , analytical chemistry (journal) , wafer , chemical engineering , composite material , chemistry , nanotechnology , plasma , crystallography , organic chemistry , physics , oceanography , quantum mechanics , geology , engineering
SiN x films were deposited on Si wafer and SUS steel (Fe–18Cr–8Ni) substrate from a hexamethyldisiloxane solution by N 2 plasma‐enhanced chemical vapor deposition equipped with a liquid injection device. The SiN x films with dense columnar structures were identified to be amorphous by means of X‐ray diffraction, scanning electron microscopy, transmission electron microscopy, and X‐ray photoelectron spectroscopy. An enhancement of deposition rate, in combination with a large amount of oxygen contaminant, was obtained after modifying the nozzle position from a top injection to a side injection method by providing a greater liquid supply. The corrosion performance of SiN x film‐coated SUS steel was evaluated by exposure test in KCl vapor atmosphere at 650°C, indicating that the high purity SiN x film demonstrated a significantly improved resistance, while an increased remanent oxygen content inside the films produced a deleterious effect on the anti‐corrosion behavior.