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Preparation of Mesoporous Silicon Nitride via a Nonaqueous Sol–Gel Route
Author(s) -
Cheng Fei,
Clark Stephen,
Kelly Stephen M.,
Bradley John S.,
Lefebvre Frédéric
Publication year - 2004
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2004.01413.x
Subject(s) - pyrolysis , mesoporous material , materials science , chemical engineering , silicon , silicon nitride , diimide , ceramic , sol gel , nitride , specific surface area , amorphous solid , inorganic chemistry , catalysis , nanotechnology , organic chemistry , layer (electronics) , chemistry , composite material , metallurgy , molecule , perylene , engineering
A silicon diimide gel Si(NH) x (NH 2 ) y (NMe 2 ) z was prepared by an acid‐catalyzed ammonolysis of tris(dimethylamino)silylamine. Pyrolysis of the gel at 1000°C under NH 3 flow led to the formation of an amorphous silicon nitride material without carbon contamination. All of the gel and pyrolyzed products exhibited a mesoporous structure with a high surface area and narrow pore‐size distribution. The effective surface area of the pyrolyzed silicon nitride residues decreases with increasing temperature, but the heating rate during pyrolysis has little influence on the surface area and pore‐size distribution of the final mesoporous ceramic Si 3 N 4 products because of the highly cross‐linked structures of the precursor silicon diimide gel.