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Change in colour of dyed aramid fabrics by sputter etching
Author(s) -
Kobayashi Shigenobu,
Wakida Tomiji,
Niu Shouhua,
Hazama Satoshi,
Doi Chizuko,
Sasakit Yoshiyuki
Publication year - 1995
Publication title -
journal of the society of dyers and colourists
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.297
H-Index - 49
eISSN - 1478-4408
pISSN - 0037-9859
DOI - 10.1111/j.1478-4408.1995.tb01706.x
Subject(s) - sputtering , etching (microfabrication) , aramid , materials science , lightness , argon , composite material , optoelectronics , optics , chemistry , nanotechnology , thin film , layer (electronics) , organic chemistry , fiber , physics
The aramid fabrics Technora and Conex, dyed with CI Disperse Yellow 54, CI Disperse Red 60 and CI Disperse Blue 56, were treated with sputter etching and argon low‐temperature plasma. The colour depth of Technora was considerably increased by sputter etching, whereas that of Conex was not. Changes in colour were investigated by the L *, C *, h colour system. The increase in colour depth due to sputter etching was greatly dependent on the decrease of metric lightness L * and the increase of metric chroma C *.