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The effect of sputter etching on the surface characteristics of dyed aramid fabrics
Author(s) -
Kobayashi Shigenobu,
Wakida Tomiji,
Niu Shouhua,
Hazama Satoshi,
Ito Taisuke,
Sasaki Yoshiyuki
Publication year - 1995
Publication title -
journal of the society of dyers and colourists
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.297
H-Index - 49
eISSN - 1478-4408
pISSN - 0037-9859
DOI - 10.1111/j.1478-4408.1995.tb01698.x
Subject(s) - aramid , sputtering , etching (microfabrication) , materials science , surface (topology) , composite material , nanotechnology , thin film , geometry , mathematics , fiber , layer (electronics)
Three kinds of aramid fabrics, Technora (modified p ‐aramid), Conex ( m ‐aramid) and Kevlar ( p ‐aramid), were subjected to sputter etching and argon low‐temperature plasma treatments after dyeing in black with disperse dyes. The depth of shade increased considerably on Technora and Kevlar with the sputter etching treatment, but not on Conex fabrics. Argon low‐temperature plasma treatment had virtually no effect on the depth of shade on the aramid fabrics.