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The effect of sputter etching on the surface characteristics of black‐dyed polyamide fabrics
Author(s) -
Ryu Jangmi,
Dai Jinjin,
Koo Kang,
Wakida Tomiji
Publication year - 1992
Publication title -
journal of the society of dyers and colourists
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.297
H-Index - 49
eISSN - 1478-4408
pISSN - 0037-9859
DOI - 10.1111/j.1478-4408.1992.tb01461.x
Subject(s) - sputtering , polyamide , etching (microfabrication) , argon , materials science , plasma etching , composite material , nylon 6 , wool , plasma , chemical engineering , chemistry , layer (electronics) , nanotechnology , polymer , thin film , organic chemistry , engineering , physics , quantum mechanics
Wool, silk, nylon 6 and Chinon (promix fibre) fabrics dyed with Cl Acid Black 155 were subjected to sputter etching and also exposed to a low‐temperature argon plasma. Many microcraters were formed on the fibre surface by the sputter etching technique and the depth of shade of the fabrics increased considerably. Neither of these effects was observed following argon plasma treatment.