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The effects of two synthetic putrescine analogues on germination and appressorium formation by uredospores of Uromyces viciae‐fabae on artificial membranes
Author(s) -
Reitz M.,
Walters D.R.,
Moerschbacher B.,
Robins D.J.
Publication year - 1995
Publication title -
letters in applied microbiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.698
H-Index - 110
eISSN - 1472-765X
pISSN - 0266-8254
DOI - 10.1111/j.1472-765x.1995.tb01061.x
Subject(s) - appressorium , putrescine , library science , germination , chemistry , biology , botany , computer science , organic chemistry , enzyme
M. REITZ, D.R. WALTERS, B. MOERSCHBACHER AND D.J. ROBINS. 1995. An examination was made of the effects of two synthetic putrescine analogues, ( E )‐1,4‐diaminobut‐2‐ene (E‐BED) and ( E )‐( N, N, N, N ‐tetraethyl)‐1,4‐diaminobut‐2‐ene (E‐TED), on germination and appressorium formation by uredospores of the rust fungus Uromyces viciaefabae on artificial membranes. E‐BED reduced germination by just 11% at 0.1 mmol 1 ‐1 and by 24% at 1 mmol 1 ‐1 , while appressorium formation was reduced by 37% at 0.05 mmol 1 ‐1 and was completely prevented at 1 mmol 1 ‐1 E‐BED. The E‐BED derivative E‐TED reduced uredospore germination by 45% at 0.05 mmol 1 ‐1 , while no appressoria were formed when uredospores were exposed to 0.05 mmol 1 ‐1 E‐TED. These results support previous suggestions that E‐BED and E‐TED exert their main effect on fungal development on the leaf surface.