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How Much do C hinese Applicants Fake?
Author(s) -
König Cornelius J.,
Wong Jan,
Cen Guozhen
Publication year - 2012
Publication title -
international journal of selection and assessment
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.812
H-Index - 61
eISSN - 1468-2389
pISSN - 0965-075X
DOI - 10.1111/j.1468-2389.2012.00596.x
Subject(s) - presentational and representational acting , psychology , anonymity , social psychology , unemployment , economics , law , philosophy , political science , economic growth , aesthetics
More and more organizations have applicants who come from different cultural backgrounds, and according to new research, these cultural backgrounds matter for applicants' self‐presentational behavior (i.e., faking). If applicants come from C hina, can organizations assume that they will present themselves modestly, as suggested by C hinese norms? Or should organizations assume that there will be much self‐presentational behavior due to the high unemployment rate, at least among C hinese graduates? To answer this question, we obtained data from 307 C hinese applicants on their self‐presentational behavior, using the randomized response technique to ensure anonymity. We compared these data with similar data sets from the U nited S tates, S witzerland, and C hina. Contrary to the proposed modesty hypothesis in C hinese samples, perhaps due to high unemployment, self‐presentation was as prevalent in C hinese samples as in A merican samples.