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Studies of aluminium coatings deposited by vacuum evaporation and magnetron sputtering
Author(s) -
GARBACZ H.,
WIECIŃSKI P.,
ADAMCZYKCIEŚLAK B.,
MIZERA J.,
KURZYDŁOWSKI K.J.
Publication year - 2010
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.2009.03297.x
Subject(s) - materials science , microstructure , aluminium , sputter deposition , metallurgy , coating , evaporation , intermetallic , texture (cosmology) , sputtering , composite material , cavity magnetron , thin film , nanotechnology , alloy , physics , image (mathematics) , artificial intelligence , computer science , thermodynamics
Summary The paper presents the results of investigations of the microstructures and properties of the aluminium coatings deposited by vacuum evaporation and magnetron sputtering. These coatings generally have a very refined microstructure with elongated nano‐grains. However, the surface topography of the aluminium coating deposited by vacuum evaporation is more developed, its microstructure is less homogeneous and more porous. The residual tensile stresses in the aluminium coating deposited by magnetron sputtering are close to 130 MPa, and the texture is relatively pronounced. Vacuum evaporation does not induce residual stresses in the coatings and the texture is very weak. The results obtained indicate that the aluminium coatings produced by magnetron sputtering are more suitable for the diffusive Ti‐Al intermetallic layers.