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TEM studies of the nitrided Ni‐Ti surface layer
Author(s) -
LELATKO J.,
PACZKOWSKI P.,
WIERZCHOŃ T.,
MORAWIEC H.
Publication year - 2006
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.2006.01628.x
Subject(s) - nitriding , materials science , nanocrystalline material , nickel titanium , layer (electronics) , tin , transmission electron microscopy , phase (matter) , scanning electron microscope , metallurgy , alloy , surface layer , glow discharge , composite material , plasma , nanotechnology , chemistry , shape memory alloy , physics , organic chemistry , quantum mechanics
Summary The structure of surface layer, obtained on the nearly equiatomic Ni‐Ti alloy after nitriding under glow discharge conditions at temperatures 700 or 800 °C, was investigated. The structural characterization of the intruded layer was performed on cross‐sectional thin foils by the use of the transmission and scanning electron microscopes. The obtained results show that the nitrided layers consist mainly of the nanocrystalline TiN phase and small amount of Ti 2 N. Between the nitrided layers and β‐NiTi matrix an intermediate Ti 2 Ni phase layer was observed.