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Microstructural characterization of nitrided Timetal 834
Author(s) -
MOSKALEWICZ T.,
GROGGER W.,
CZYRSKAFILEMONOWICZ A.
Publication year - 2006
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.2006.01618.x
Subject(s) - nitriding , microstructure , materials science , transmission electron microscopy , layer (electronics) , tin , silicide , metallurgy , phase (matter) , alloy , substrate (aquarium) , analytical chemistry (journal) , composite material , nanotechnology , chemistry , oceanography , organic chemistry , chromatography , geology
Summary The microstructure of Timetal 834, in as‐received condition and after nitriding under glow discharge has been examined by light microscopy and analytical transmission electorn microscopy (TEM) methods (SAED, EDS, EELS and EFTEM). The microstructure of the as‐received alloy consists of the α phase and a small amount of the β phase. Silicide precipitates (Zr 5 Si 4 ) are present both inside the grains and at the grain boundaries. TEM investigations of cross‐sectional thin foils allow for detailed analysis of the nitrided layer microstructure. It was found that the nitrided layer exhibits a graded character with continuously varying nitrogen content. The outermost sublayer consists of nanocrystals of δ‐TiN. The following sublayers consist mainly of δ′‐Ti 2 N and ɛ‐Ti 2 N grains. The last sublayer, closest to the substrate, is identified as a nitrogen‐rich α(N) solid solution containing up to 14 at% of nitrogen.