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Structural characterization of TiN/NbN multilayers: X‐ray diffraction, energy‐filtered TEM and Fresnel contrast techniques compared
Author(s) -
LLOYD S. J.,
MOLINAALDAREGUIA J. M.,
CLEGG W. J.
Publication year - 2005
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.2005.01454.x
Subject(s) - characterization (materials science) , diffraction , transmission electron microscopy , materials science , tin , wavelength , contrast (vision) , optics , x ray crystallography , resolution (logic) , fresnel diffraction , x ray , optoelectronics , nanotechnology , physics , artificial intelligence , computer science , metallurgy
Summary Two TiN/NbN multilayers with wavelength 13.6 and 6.15 nm have been characterized by X‐ray diffraction (XRD), Fresnel contrast analysis (FCA) and energy‐filtered transmission electron microscopy (EFTEM). Good agreement between the composition profile obtained by FCA and EFTEM is obtained if the lower resolution of the EFTEM images is taken into account. The relative advantages and disadvantages of the techniques are discussed. Used together the two TEM techniques provide a quantitative characterization that is consistent with, and for some parameters provides more precise values than, that from XRD. The analysis shows that the multilayers have narrow interfaces (< 1 nm) and a composition amplitude close to 95% for the longer wavelength.