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Waveguide sidewall roughness measurement on full wafers by SEM‐based stereoscopy
Author(s) -
BONY A.,
HEID A.,
TAKAKURA Y.,
SATZKE K.,
MEYRUEIS P.
Publication year - 2005
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.2005.01387.x
Subject(s) - stereoscopy , wafer , materials science , surface finish , optics , scanning electron microscope , surface roughness , waveguide , cover (algebra) , optoelectronics , computer science , mechanical engineering , engineering , composite material , physics
Summary We present a technique aiming at sidewall roughness measurement on integrated optical silica waveguides using a scanning electron microscope. The technique uses the principles of stereoscopy to retrieve sidewall topography. Practical implementation details and first results are provided.