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Progress in near‐field photothermal infra‐red microspectroscopy
Author(s) -
Hammiche A.,
Bozec L.,
Pollock H. M.,
German M.,
Reading M.
Publication year - 2004
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.2004.01292.x
Subject(s) - photothermal therapy , diffraction , materials science , microscopy , optics , resolution (logic) , image resolution , photothermal effect , analyte , atomic force microscopy , photothermal spectroscopy , fourier transform infrared spectroscopy , analytical chemistry (journal) , optoelectronics , nanotechnology , chemistry , computer science , chromatography , physics , artificial intelligence
Summary Near‐field photothermal Fourier transform infra‐red microspectroscopy, which utilizes atomic force microscopy (AFM)‐type temperature sensors, is being developed with the aim of achieving a spatial resolution higher than the diffraction limit. Here we report on a new implementation of the technique. Sensitivity of the technique is assessed by recording infra‐red spectra from small quantities of analytes and thin films. A photothermomechanical approach, which utilizes conventional AFM probes as temperature sensors, is also discussed based on preliminary results. Early indication suggests that the photothermal approach is more sensitive than the thermomechanical one.