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Improved ultrastructural preservation of yeast cells for scanning electron microscopy
Author(s) -
HANSCHKE R.,
SCHAUER F.
Publication year - 1996
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1996.tb00002.x
Subject(s) - uranyl acetate , osmium tetroxide , yeast , tannic acid , scanning electron microscope , shrinkage , ultrastructure , fixation (population genetics) , osmium , chemistry , electron microscope , microscopy , biophysics , materials science , biochemistry , biology , botany , composite material , pathology , optics , organic chemistry , medicine , physics , gene , ruthenium , catalysis
Summary The processing of yeast cells for scanning electron microscopy by conventional sequential fixation with glutaralde‐hyde and osmium tetroxide and subsequent dehydration and critical point‐drying caused pronounced deformation and visible shrinkage in all basidiomycetous and ascomy‐cetous yeast strains studied. The mean cell diameter decreased to nearly 60 and 70%, respectively. After an additional sequential fixation with 1% tannic acid and 0–5% uranyl acetate the cell shrinkage was significantly reduced, but the most important result was a considerable reduction of wrinkling and deformation of the yeast cells.