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A scanning tunnelling microscopy study of the formation and chemical activation of step defects on the basal plane of pyrolytic graphite
Author(s) -
MOROZOV V. N.,
SHERMAN J.,
KALLENBACH N. R.,
DU SHOU MING,
SEEMAN N. C.
Publication year - 1993
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1993.tb03347.x
Subject(s) - pyrolytic carbon , basal plane , graphite , highly oriented pyrolytic graphite , materials science , cyanuric chloride , microscopy , molecule , cyanuric acid , etching (microfabrication) , covalent bond , chemistry , nanotechnology , crystallography , pyrolysis , composite material , optics , melamine , organic chemistry , polymer chemistry , physics , layer (electronics)
Summary Scanning tunnelling microscopy is used to monitor etching of the basal plane of highly orientated pyrolytic graphite by ozone, oxygen and nitric acid. These treatments are seen to produce numerous single and multilayer step defects. Subsequent modification of the graphite sheet edges flanking these cavities by cyanuric chloride, TiCl 4 and other reagents is shown to activate the edges, thereby making them capable of covalently binding various molecules.