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Cryosputtering—a combined freeze‐drying and sputtering method for high‐resolution electron microscopy
Author(s) -
Lindroth Margaretha,
Fredriksson BengtArne,
Bell Paul B.
Publication year - 1991
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1991.tb03086.x
Subject(s) - sputtering , coating , materials science , scanning electron microscope , transmission electron microscopy , environmental scanning electron microscope , tungsten , vacuum chamber , sputter deposition , composite material , analytical chemistry (journal) , chemical engineering , nanotechnology , metallurgy , chemistry , thin film , chromatography , engineering
SUMMARY Preparing cellular structures for visualization by high‐resolution scanning electron microscopy (SEM) is a multi‐step process which includes fixation, dehydration, drying and metal coating. Drying and metal coating are limiting for high‐resolution work. Commonly, the dried samples are exposed to the air before they are inserted into a metal coating apparatus, thereby exposing them to moisture and the accompanying risk of rehydration, which may cause changes in the supramolecular structure. We have modified a freeze‐dryer to accommodate a magnetron sputtering head, in order to sputter‐coat the frozen‐dried samples while still in the drying chamber in the cold, a process we call cryosputtering. A layer of 1·5 nm of tungsten was cryosputtered onto whole mounts of cytoskeletons from detergent‐extracted human glioma cells or fibroblasts and the specimens were examined by high‐resolution SEM and transmission electron microscopy (TEM). To reduce the effects of backstreaming oil from the vacuum system, a turbomolecular pump backed by a two‐stage rotary vane pump was connected to the drying‐coating chamber. This pump system provides a high vacuum, making it possible to dry the specimens at — 90°C/183 K, thus reducing the risk for recrystallization of water. Furthermore, the high vacuum minimizes the negative effects of contaminants, which can be deposited onto the specimen surface and affect the quality of the metal coat formed during sputtering.