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Effects of sputtering on the surface of graphite
Author(s) -
Nakagiri Nobuyuki,
Koga Yasunori,
Miyazaki Yasumichi
Publication year - 1988
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1988.tb01385.x
Subject(s) - sputtering , surface finish , surface roughness , graphite , etching (microfabrication) , materials science , graph , optics , analytical chemistry (journal) , composite material , chemistry , nanotechnology , thin film , physics , mathematics , layer (electronics) , discrete mathematics , chromatography
SUMMARY We present STM images of the sputtered surfaces of graphite after different sputtering times. The roughness (r.m.s.) and the peak‐to‐valley distance were calculated from the digitized STM signals. The roughness versus etching time graph shows that the roughness increases with etching time initially, but does not change with increased sputtering later. The peak‐to‐valley distance is proportional to the roughness with a coefficient of 8·7. The Fourier transform shows peaks corresponding to the size of mountains created on the sputtered surfaces.