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Electron beam modifications of InP surfaces
Author(s) -
Milne R. H.,
Fan T. W.
Publication year - 1987
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1987.tb02819.x
Subject(s) - faceting , cathode ray , reflection (computer programming) , materials science , reflection high energy electron diffraction , electron microscope , beam (structure) , optics , electron , layer (electronics) , chemistry , nanotechnology , crystallography , physics , epitaxy , quantum mechanics , computer science , programming language
SUMMARY InP surfaces have been modified by using the intense electron beam of a V.G. HB501 STEM and subsequently examined in the same instrument using the reflection microscopy geometry. The surface changes can be divided into two parts; first, a fairly local removal of material, and second, more widespread effects including faceting and the formation of an oxide layer which extends for several microns around the point of incidence of the electron beam.