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Measurement of characteristic wavelengths in modulated microstructures by field‐ion microscopy
Author(s) -
Miller M. K.,
Burke M. G.,
Brenner S. S.
Publication year - 1985
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1985.tb04659.x
Subject(s) - micrograph , wavelength , optics , materials science , electron micrographs , microstructure , diffraction , microscopy , orientation (vector space) , electron microscope , scanning electron microscope , ion , optical microscope , projection (relational algebra) , physics , composite material , geometry , mathematics , algorithm , quantum mechanics , computer science
SUMMARY A procedure to determine the characteristic wavelength of a modulated microstructure from field‐ion micrographs is described. The procedure accounts for the effects of the orientation of the modulations in the specimen and the projection of the curved FIM specimen surface by correlating the measurements from the micrograph with computer simulated micrographs generated with the same orientation. The results exhibit excellent agreement with measurements determined from the spacing of sidebands in electron diffraction patterns.