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Simple procedures for the transfer of grid images onto glass coverslips for the rapid relocation of cultured cells
Author(s) -
Small J. V.
Publication year - 1985
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1985.tb02574.x
Subject(s) - scanning electron microscope , electron microscope , microscope , materials science , grid , optics , grid pattern , chemistry , composite material , physics , geometry , mathematics
SUMMARY Procedures are described whereby electron microscope‐grid images may be transferred onto the surface of glass coverslips. By using coordinate grids, patterns are obtained that are ideal for the rapid relocation of cultured cells. Two basic procedures are presented. In the first, metal is evaporated, in a vacuum unit, onto glass coverslips carrying electron microscope grids to produce an exposed, glass replica of the grid pattern. The grid pattern is then etched in the glass surface with hydrofluoric acid and the metal subsequently dissolved away. In the second method silicone monoxide is evaporated onto coverslips carrying a ‘negative grid’ or a negative grid image, to produce a pattern directly visible in the phase contrast or interference microscope. Modifications for scanning electron microscopy are also described.