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Investigation of wear phenomena by microscopy
Author(s) -
Buckley Donald H.
Publication year - 1984
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1984.tb00513.x
Subject(s) - microscopy , materials science , atomic force microscopy , nanotechnology , mechanism (biology) , process (computing) , computer science , optics , physics , quantum mechanics , operating system
SUMMARY This paper discusses the various wear mechanisms involved in the loss of material from metallic and nonmetallic surfaces. The results presented indicate how various microscopy techniques used in conjunction with other analytical tools can assist in the elucidation of a wear mechanism. Microscopy is the single most important tool for the study of the wear of surfaces, to assess address inherent mechanisms of the material removal process.