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Factors affecting the ion‐beam thinning characteristics of ceramics
Author(s) -
Salehpoor B.,
Marquis P. M.
Publication year - 1981
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1981.tb02486.x
Subject(s) - thinning , ion beam , beam (structure) , materials science , ion , stoichiometry , ceramic , focused ion beam , crystal (programming language) , composite material , chemistry , optics , physics , ecology , organic chemistry , computer science , biology , programming language
SUMMARY A study of the factors that affect thinning rates and damage processes during the ion‐beam thinning of ceramics has been undertaken. The results of these studies are reported and related to the conditions necessary for the preparation of uniform damage free specimens. Particular emphasis is placed on the variations in specimen stoichiometry that can occur during ion‐beam thinning. It is shown that under certain conditions the positively charged ion‐beam can induce charged interstitial migration into the bulk of the sample. The extent to which this effect, atomic bonding, crystal orientation and beam conditions can produce non‐uniform samples is discussed.