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A resistance monitor with power cut‐off for automatic regulation of shadow and support film thickness in freeze‐etching and related techniques
Author(s) -
Steere Russell L.,
Erbe Eric F.,
Moseley J. Michael
Publication year - 1977
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1977.tb00071.x
Subject(s) - shadow mask , replica , etching (microfabrication) , shadow (psychology) , materials science , evaporation , optoelectronics , vacuum evaporation , power (physics) , thin film , isotropic etching , substrate (aquarium) , nanotechnology , optics , physics , art , psychology , oceanography , layer (electronics) , quantum mechanics , geology , visual arts , psychotherapist , thermodynamics
SUMMARY A resistance monitor with sensors and automatic power cut‐off has been developed to control the thickness of Pt‐C shadow and C replica films in freeze‐etching and related techniques. The monitor and sensors, in conjunction with newly modified evaporators, should considerably reduce the amount of C and Pt required and should prove useful in other applications employing vacuum evaporation of thin films of Pt, C, or other conducting materials.