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Field‐ion microscopy of segregation to planar imperfections
Author(s) -
Howell P. R.,
Fleet D. E.,
Hildon A.,
Ralph B.
Publication year - 1976
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.1365-2818.1976.tb02433.x
Subject(s) - niobium , planar , field ion microscope , alloy , materials science , stacking , tungsten , cobalt , chromium , grain boundary , microscopy , field (mathematics) , ion , crystallography , metallurgy , condensed matter physics , chemistry , optics , microstructure , physics , mathematics , pure mathematics , computer graphics (images) , organic chemistry , computer science
SUMMARY This paper investigates the segregation of solute to planar imperfections using field‐ion microscopy. Two major systems have been analysed, namely the segregation of chromium to grain boundaries in a tungsten‐chromium alloy, and the segregation of niobium to stacking faults in a cobalt‐niobium alloy. In both cases, the solute distributions within the planar faults were quantitatively analysed, and a strong tendency towards clustering of the niobium solute within the stacking faults of the cobalt alloy was observed.