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Inactivation of Escherichia coli O157:H7 on Inoculated Alfalfa Seeds with Pulsed Ultraviolet Light and Response Surface Modeling
Author(s) -
Sharma R.R.,
Demirci A.
Publication year - 2003
Publication title -
journal of food science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.772
H-Index - 150
eISSN - 1750-3841
pISSN - 0022-1147
DOI - 10.1111/j.1365-2621.2003.tb09665.x
Subject(s) - escherichia coli , inoculation , ultraviolet , microbiology and biotechnology , ultraviolet light , chemistry , biology , materials science , horticulture , biochemistry , photochemistry , optoelectronics , gene
: Escherichia coli O157:H7‐inoculated alfalfa seeds with seed layer thicknesses of 1.02 to 6.25 mm were subjected to pulsed UV light for up to 90 s at a 8‐cm distance from the UV strobe. Population reductions higher than 4 log 10 colony‐forming units (CFU)/g were achieved. For effect of distance from the UV strobe, seeds with 6.25‐mm layer thickness were treated 3 to 13 cm from the strobe. Reductions at shorter distances, such as 60 s at 5 cm (1.93 log 10 CFU/g) and 60 to 90 s at 8 cm (4.89 log 10 CFU/g), were significantly higher ( P ≤ 0.05). Data from the treatments were used to develop empirical models as a function of distance or layer thickness and treatment time for predicting the population of E. coli O157:H7 during pulsed UV‐light treatment. This study demonstrates that pulsed UV light holds promise for eliminating pathogens from alfalfa seeds, and the models developed can be useful predictive tools.