z-logo
Premium
Diffusion of NH + 4 and NO − 3 mineralized from organic N in soil
Author(s) -
DARRAH P. R.,
NYE P. H.,
WHITE R. E.
Publication year - 1983
Publication title -
journal of soil science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.244
H-Index - 111
eISSN - 1365-2389
pISSN - 0022-4588
DOI - 10.1111/j.1365-2389.1983.tb01065.x
Subject(s) - loam , nitrification , chemistry , mineralization (soil science) , desorption , soil water , adsorption , diffusion , freundlich equation , analytical chemistry (journal) , nitrogen , environmental chemistry , soil science , thermodynamics , geology , organic chemistry , physics
Summary The mineralization of native soil organic matter and the simultaneous diffusion of zero NH + 4 and NO − 3 to a solution sink of zero N concentration was analysed experimentally and theoretically for a fine sandy loam soil. Experimentally, the NH 4 and NO 3 ions produced in an incubated unsaturated soil column were allowed to diffuse through a sintered glass plate into a stirred solution sink. The distribution of NH + 4 and NO − 3 in the soil column was measured after various incubation times. The rate of ammonification was measured directly during incubation and the rate of nitrification modelled from nitrifier growth kinetics. A Freundlich equation was used to describe the equilibrium between soluble and exchangeable NH + 4 in the soil. Terms for the microbial transformation of N and the adsorption‐desorption of NH + 4 were combined with diffusion equations which were solved numerically using finite difference methods. The model constructed was used to predict the NH + 4 and NO − 3 con‐centration distributions in the soil column, and good agreement was obtained between the experimental and predicted concentration profiles. The use of the model for predicting the diffusive flux of mineral N to the outer surfaces of soil peds, where it is vulnerable to leaching, was demonstrated.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here