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Fabrication of TiN/Si 3 N 4 Ceramics by Spark Plasma Sintering of Si 3 N 4 Particles Coated with Nanosized TiN Prepared by Controlled Hydrolysis of Ti(O‐ i ‐C 3 H 7 ) 4
Author(s) -
Kawano Shuichi,
Takahashi Junichi,
Shimada Shiro
Publication year - 2003
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.2003.tb03360.x
Subject(s) - tin , materials science , spark plasma sintering , ceramic , nitriding , electrical resistivity and conductivity , sintering , metallurgy , electrical discharge machining , chemical engineering , analytical chemistry (journal) , composite material , machining , chemistry , layer (electronics) , chromatography , electrical engineering , engineering
TiN‐coated Si 3 N 4 particles were prepared by depositing TiO 2 on the Si 3 N 4 surfaces from Ti(O‐ i ‐C 3 H 7 ) 4 solution, the TiO 2 being formed by controlled hydrolysis, then subsequently nitrided with NH 3 gas. A homogeneous TiO 2 coating was achieved by heating a Si 3 N 4 suspension containing 1.0 vol% H 2 O with the precursor at 40°C. Nitridation successfully produced Si 3 N 4 particles coated with 10–20 nm TiN particles. Spark plasma sintering of these TiN/Si 3 N 4 particles at 1600°C yielded composite ceramics with a relative density of 96% at 25 vol% TiN and an electrical resistivity of 10 −3 Ω·cm in compositions of 17.5 and 25 vol% TiN/Si 3 N 4 , making these ceramics suitable for electric discharge machining.