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Diffusion of Neodymium into Sputtered Films of Tantalum Pentoxide
Author(s) -
Sager David A.,
Apostolopoulos Vasilis,
Wilkinson James S.
Publication year - 2002
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.2002.tb00501.x
Subject(s) - neodymium , tantalum pentoxide , tantalum , diffusion , materials science , doping , amorphous solid , analytical chemistry (journal) , thin film , phase (matter) , optoelectronics , chemistry , optics , metallurgy , nanotechnology , thermodynamics , crystallography , laser , physics , organic chemistry , chromatography
In this communication the diffusion of neodymium into rf‐sputtered films of tantalum pentoxide (Ta 2 O 5 ) has been investigated using the SIMS technique. The diffusion characteristics were obtained for a temperature of 1100°C, and the results showed a time‐dependent diffusion coefficient that reflects a transition of the sputtered films from the amorphous to the crystalline phase. The potential for doping films of Ta 2 O 5 with neodymium by diffusion, for the realization of novel active optical devices, is also discussed.