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Hydrolysis Deposition of Thin Films of Antimony‐Doped Tin Oxide
Author(s) -
Tsukuma Koji,
Akiyama Tomoyuki,
Imai Hiroaki
Publication year - 2001
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.2001.tb00755.x
Subject(s) - antimony , tin oxide , tin , antimony oxide , inorganic chemistry , thin film , doping , materials science , hydrolysis , oxide , fluoride , deposition (geology) , electrical resistivity and conductivity , metal , chemistry , metallurgy , nanotechnology , organic chemistry , optoelectronics , paleontology , engineering , biology , sediment , electrical engineering
Thin films of antimony‐doped tin oxide have been obtained by a new technique, the so‐called hydrolysis deposition method, in which hydrolyzed solids are precipitated from metal fluoride solutions. Mixed solutions of SnF 3 and SbF 3 produce antimony‐ and fluorine‐doped tin oxide films. The amount of antimony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The film containing 2.9 mol% antimony heated at 500°C has an electrical resistivity of 1.0 × 10 − 3 Ω·cm, which is lower than previously obtained by wet‐chemical techniques.