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Silicon Carbide Films by Laser Pyrolysis of Polycarbosilane
Author(s) -
Colombo Paolo,
Martucci Alessandro,
Fogato Oscar,
Villoresi Paolo
Publication year - 2001
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.2001.tb00636.x
Subject(s) - materials science , silicon carbide , ceramic , pyrolysis , graphite , thin film , laser , inert , annealing (glass) , inert gas , substrate (aquarium) , composite material , silicon , chemical engineering , nanotechnology , optoelectronics , optics , organic chemistry , chemistry , physics , oceanography , geology , engineering
Thin films of polycarbosilane were deposited on Si and SiO 2 substrates. Instead of conventional oven annealing (high temperatures, inert atmosphere), laser pyrolysis was used to achieve the polymer‐to‐ceramic conversion. In some conditions, especially when laser radiation absorption was enhanced by depositing a carbon layer on the surface of as‐deposited films or by embedding graphite particles, this processing method yielded SiC ceramic coatings, without damaging the substrate. Processing in air or low vacuum did not result in oxidized coatings, contrary to what happens for oven pyrolysis. Laser‐converted films were similar to oven‐heated films processed at 1000° to 1200°C.