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Modeling of Laser‐Induced Chemical Vapor Deposition of Silicon Carbide Rods from Tetramethylsilane
Author(s) -
Shaarawi Mohammed S.,
Sanchez Juan M.,
Kan Honghua,
Manthiram Arumugam
Publication year - 2000
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.2000.tb01495.x
Subject(s) - tetramethylsilane , chemical vapor deposition , deposition (geology) , silicon carbide , materials science , rod , electron beam physical vapor deposition , silicon , combustion chemical vapor deposition , pulsed laser deposition , carbon fibers , chemical engineering , carbon film , analytical chemistry (journal) , chemistry , thin film , nanotechnology , composite material , optoelectronics , environmental chemistry , organic chemistry , composite number , medicine , paleontology , alternative medicine , pathology , sediment , engineering , biology
Finite‐difference fluid‐dynamics modeling has been used to predict deposition rates, fractional amounts of phases, and deposition morphology for the codeposition of silicon carbide and pyrolitic carbon from tetramethylsilane via laser‐induced chemical vapor deposition (LCVD). Calculated results agree fairly well with rod deposition experiments. The morphologic features of rods that have been grown using LCVD are examined and explained using the results of the finite‐difference calculations.