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Structural Analysis of Heat‐Treated Chromium Oxycarbide Films
Author(s) -
Kado Tetsuo
Publication year - 1999
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1999.tb02232.x
Subject(s) - thermogravimetric analysis , chromium , thermal stability , materials science , differential thermal analysis , decomposition , thermal decomposition , copper , chemical vapor deposition , analytical chemistry (journal) , atmospheric temperature range , deposition (geology) , thermal analysis , metallurgy , mineralogy , chemical engineering , chemistry , thermal , nanotechnology , diffraction , thermodynamics , environmental chemistry , organic chemistry , paleontology , physics , optics , sediment , biology , engineering
Chromium oxycarbide (Cr 2 CO) films were deposited on stainless steel and copper plates via plasma‐assisted chemical vapor deposition. The films were heated to 1073 K under high‐vacuum conditions, to examine the high‐temperature stability of the films. X‐ray diffractometry revealed that the films decomposed to a mixed structure of Cr 2 O 3 and Cr 3 C 2 . Thermogravimetric analysis and differential thermal analysis revealed that the decomposition occurred in the temperature range of 858‐910 K.