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Densification and Mechanical Properties of Titanium Diboride with Silicon Nitride as a Sintering Aid
Author(s) -
Park JuneHo,
Koh YoungHag,
Kim HyounEe,
Hwang Cheol Seong,
Kang Eul Son
Publication year - 1999
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1999.tb02199.x
Subject(s) - materials science , sintering , titanium diboride , boron nitride , microstructure , titanium , titanium nitride , amorphous solid , tin , flexural strength , silicon nitride , metallurgy , nitride , grain growth , composite material , silicon , layer (electronics) , crystallography , ceramic , chemistry
Titanium diboride (TiB 2 ) was hot‐pressed at a temperature of 1800°C, and silicon nitride (Si 3 N 4 ) was added as a sintering aid. The amount of Si 3 N 4 that was added had a significant influence on the sinterability and mechanical properties of the TiB 2 . When a small amount (2.5 wt%) of Si 3 N 4 was added, the Si 3 N 4 reacted with titania (TiO 2 ) that was present on the surface of the TiB 2 powder to form titanium nitride (TiN), boron nitride (BN), and amorphous silica (SiO 2 ). The elimination of TiO 2 suppressed the grain growth effectively, which led to an improvement in the densification of TiB 2 . The formation of SiO 2 also was deemed beneficial for densification. The mechanical properties‐especially, the flexural strength‐were enhanced remarkably through these improvements in the sinterability and microstructure. On the other hand, when a large amount (greaterthan equal to5 wt%) of Si 3 N 4 was added, the mechanical properties were not improved much, presumably because of the extensive formation of a glassy Si‐Ti‐O‐N phase at the grain boundaries.