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Conversion Efficiency of Alkoxide Precursor to Oxide Films Grown by an Ultrasonic‐Assisted, Pulsed Liquid Injection, Metalorganic Chemical Vapor Deposition (Pulsed‐CVD) Process
Author(s) -
Krumdieck Susan,
Raj Rishi
Publication year - 1999
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1999.tb01968.x
Subject(s) - materials science , chemical vapor deposition , rutile , oxide , chemical engineering , alkoxide , crystallite , superalloy , thermal decomposition , nickel , titanium dioxide , thin film , nickel oxide , inorganic chemistry , mineralogy , metallurgy , microstructure , nanotechnology , catalysis , chemistry , organic chemistry , engineering
Polycrystalline coatings of an oxide, with a columnar grain morphology, were grown on metal substrates from metalorganic precursors using the pulsed‐CVD process. In a model study, films of the rutile phase of titanium dioxide were grown on nickel by thermal decomposition of titanium isopropoxide. Growth rates of up to 0.3 µm/min were obtained with conversion efficiencies (mole oxide per mole precursor) approaching 100%. The high growth rates and conversion efficiencies portend the application of this method for the manufacture of films and coatings on large surface areas, as, for example, required in the deposition of zirconium dioxide on nickel‐based superalloys to serve as thermal barrier coatings on turbine blades.