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Nanostructuring of Laser‐Deposited Ti Films by Self‐Limited Oxidation
Author(s) -
Gorbunov Andre A.,
Pompe Wolfgang,
Eichler Horst,
Huey Bryan,
Bonnell Dawn A.
Publication year - 1997
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1997.tb03035.x
Subject(s) - materials science , laser , absorption (acoustics) , diffraction , oxide , titanium , thin film , molar absorptivity , optics , metal , titanium oxide , optoelectronics , nanotechnology , chemical engineering , composite material , metallurgy , physics , engineering
Local laser‐induced oxidation of thin titanium films on glass is shown to be self‐limiting due to a decrease in the absorptivity during the reaction. Taking advantage of this confinement, stable writing of transparent oxide line structures narrower than the diffraction‐limited focused spot of a continuous wave Ar ion laser (500 nm) has been accomplished. The greatest optical contrast (1:10) with the highest resolution down to 165 nm was observed if the film thickness is of the order of the light absorption length in the metal.