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Chemical Vapor Deposition of YBa 2 Cu 3 O x in a Cold Plasma Reactor sing an Aerosol Vaporization Technique
Author(s) -
Chung Yong S.,
Hill D. Norman,
Carter W. Brent,
Lackey W. Jack
Publication year - 1996
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1996.tb07928.x
Subject(s) - vaporization , analytical chemistry (journal) , chemical vapor deposition , stoichiometry , aerosol , aqueous solution , distilled water , materials science , atmospheric temperature range , evaporation , solubility , vapor pressure , chemistry , inorganic chemistry , chromatography , organic chemistry , physics , thermodynamics , meteorology
A plasma‐enhanced chemical vapor deposition technique, utilizing an aerosol decomposition/vaporization process in a cold plasma reactor, was used to form YBa 2 Cu 3 O, (YBCO) thin films on single‐crystal MgO substrates. Aerosol droplets of the precursors were generated by an ultrasonic nebulizer operating at 1.63 MHz, while a 50 kW rf generator, operating at 2.87 MHz, was used to create the plasma and heat a stainless steel susceptor. Nitrate, acetylacetonate, and tetramethylheptanedionate compounds were used as precursors, and distilled water, ethyl alcohol, and an aqueous benzoic acid solution were investigated as solvents for the aerosol solution. The effects of the solubility and decomposition temperature of the chemical precursors, and the vapor pressure of the solvents, on the microstructure and phase assemblage of the deposits were determined. Specific combinations of substrate temperature, in the range of 800°‐940°C, and oxygen partial pressure, in the range of 0.3–2.7 kPa, were found to produce in situ , crystalline, stoichiometric YBCO films.