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Effect of O 2 Concentration in Firing Atmosphere on Resistance of RuO 2 ‐Glass Thick‐Film Resistors
Author(s) -
Nakano Takashi,
Yamaguchi Takashi
Publication year - 1995
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1995.tb08875.x
Subject(s) - oxygen , materials science , resistor , atmosphere (unit) , limiting oxygen concentration , mineralogy , composite material , chemistry , thermodynamics , electrical engineering , physics , organic chemistry , voltage , engineering
The effect of oxygen concentration in the firing atmosphere on the resistance of RuO 2 ‐glass thick‐film resistors (TFRs) has been studied using glasses with various compositions. The resistance decreased with increasing oxygen concentration for TFRs made from PbO‐containing glasses, but TFRs prepared from PbO‐free glasses exhibited no oxygen concentration dependence of resistance. Experimental results suggest that the RuO 2 ‐PbO interaction is responsible for the oxygen concentration dependence of the resistance.