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Deposition of Pb(Zr,Ti)O 3 Thin Films by Metal‐Organic Chemical Vapor Deposition Using β‐diketonate Precursors at Low Temperatures
Author(s) -
Hwang Cheol Seong,
Kim Hyeong Joon
Publication year - 1995
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1995.tb08804.x
Subject(s) - thin film , materials science , crystallinity , chemical vapor deposition , amorphous solid , lead zirconate titanate , metalorganic vapour phase epitaxy , combustion chemical vapor deposition , diffusion barrier , substrate (aquarium) , chemical engineering , deposition (geology) , mineralogy , carbon film , layer (electronics) , analytical chemistry (journal) , epitaxy , ferroelectricity , composite material , nanotechnology , dielectric , crystallography , chemistry , organic chemistry , oceanography , engineering , biology , paleontology , optoelectronics , sediment , geology
Lead zirconate titanate (PZT) thin films were deposited by metal‐organic chemical vapor deposition (MOCVD) using β‐diketonate precursors and 0 2 at temperatures below 500°C on variously passivated Si substrates. PZT thin films could not be deposited on bare Si substrates, owing to a serious diffusion of Pb into the Si substrate during deposition. Pt/SiO 2 /Si substrates could partially block the diffusion of Pb, but a direct deposition of PZT thin films on the Pt/SiO 2 /Si substrates resulted in a very inhomogeneous deposition. A TiO 2 buffer layer deposited on Pt/SiO 2 /Si substrates could partially suppress the diffusion of Pb and produce homogeneous thin films. However, the crystallinity of PZT thin films deposited on the TiO 2 ‐buffered Pt/SiO 2 /Si substrate was not good enough, and the films showed random growth direction. PZT thin films deposited on the PbTiO 3 ‐buffered Pt/SiO 2 /Si substrates had good crystallinity and a‐ and c‐axis oriented growth direction. However, the PZT thin film deposited at 350°C showed fine amorphous phases at the grain boundaries, owing to the low chemical reactivities of the constituent elements at that temperature, but they could be crystallized by rapid thermal anneaiing (RTA) at 700°C. PZT thin film deposited on a 1000‐å PbTiO 3 ,‐thin‐film‐buffered Pt/SiO 2 /Si substrate at 350°C and rapid thermally annealed at 700°C for 6 min showed a single‐phase perovskite structure with a composition near the morphotropic boundary composition.