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Solid‐state Reactions and Phase Relations in the Ti‐Si‐O System at 1373 K
Author(s) -
Goldstein Joseph I.,
Choi Seung K.,
Loo Frans J. J.,
Bastin Guillaume F.,
Metselaar Rudi
Publication year - 1995
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1995.tb08802.x
Subject(s) - phase (matter) , solid state , state (computer science) , materials science , mineralogy , chemistry , computer science , algorithm , organic chemistry
Reactions between Ti and SiO 2 were studied at 1373 K (1100°C) under vacuum conditions using planar diffusion couples. A method to correct for the presence of surface oxide was developed which led to improved oxygen measurements with the electron probe microanalyzer. An isothermal section through the Ti‐Si‐O phase diagram at 1373 K was determined using measured diffusion paths and phase compositions in equilibrated alloys. The experimentally determined isothermal section was compared to isothermal sections calculated using thermodynamic data. In addition the sequence of reaction layers formed in the diffusion couples is discussed in terms of thermodynamic activity diagrams.