z-logo
Premium
Effects of Temperature and Reagent Concentration on the Morphology of Chemically Vapor Deposited β‐Ta 2 O 5
Author(s) -
Bae Yong W.,
Lee Woo Y.,
Stinton David P.
Publication year - 1995
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1995.tb08485.x
Subject(s) - morphology (biology) , materials science , chemical vapor deposition , texture (cosmology) , deposition (geology) , coating , mineralogy , reagent , atmospheric temperature range , porosity , chemical engineering , metallurgy , chemistry , composite material , nanotechnology , thermodynamics , paleontology , genetics , physics , artificial intelligence , sediment , computer science , engineering , image (mathematics) , biology
Crystalline β‐Ta 2 O 5 coatings were deposited on hot‐isostatically‐pressed Si 3 N 4 by reacting TaCl 5 with H 2 and CO 2 in the temperature range of 1000°–1300°C and at a pressure of 660 Pa. The Ta 2 O 5 coatings generally consisted of wellcoalesced 2–3 μm grains, resulting in the formation of a nonporous coating morphology. However, the presence of microcracks on the as‐deposited surface was consistently observed. The surface morphology, texture, and growth rate of the coatings were examined as a function of deposition parameters.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom