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Effects of Temperature and Reagent Concentration on the Morphology of Chemically Vapor Deposited β‐Ta 2 O 5
Author(s) -
Bae Yong W.,
Lee Woo Y.,
Stinton David P.
Publication year - 1995
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1995.tb08485.x
Subject(s) - morphology (biology) , materials science , chemical vapor deposition , texture (cosmology) , deposition (geology) , coating , mineralogy , reagent , atmospheric temperature range , porosity , chemical engineering , metallurgy , chemistry , composite material , nanotechnology , thermodynamics , paleontology , genetics , physics , artificial intelligence , sediment , computer science , engineering , image (mathematics) , biology
Crystalline β‐Ta 2 O 5 coatings were deposited on hot‐isostatically‐pressed Si 3 N 4 by reacting TaCl 5 with H 2 and CO 2 in the temperature range of 1000°–1300°C and at a pressure of 660 Pa. The Ta 2 O 5 coatings generally consisted of wellcoalesced 2–3 μm grains, resulting in the formation of a nonporous coating morphology. However, the presence of microcracks on the as‐deposited surface was consistently observed. The surface morphology, texture, and growth rate of the coatings were examined as a function of deposition parameters.