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Preparation and Optical Nonlinear Property of Sol–Gel‐Derived Cu─SiO 2 Thin Films
Author(s) -
Kundu Debtosh,
Honma Itaru,
Osawa Toshio,
Komiyama Hiroshi
Publication year - 1994
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1994.tb07282.x
Subject(s) - materials science , sol gel , metal , doping , thin film , copper , nonlinear optical , surface plasmon , chemical engineering , analytical chemistry (journal) , plasmon , nonlinear system , nanotechnology , metallurgy , chemistry , optoelectronics , chromatography , physics , quantum mechanics , engineering
Cu‐metal‐doped glass films having a Cu:Si atomic ratio of 0.05 ± 0.002 were successfully prepared by a sol‐gel method using a dipping technique. The appearance of surface plasmon of Cu metal at about 570 nm was observed after heat treatment at or above 700°C. The third‐order nonlinear susceptibility (x 3 ) was as high as 5.0 × 10 –8 esu at 570 nm.