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Electrochemical Liquid Deposition of Ceria
Author(s) -
Tanner Cameron W.,
Virkar Anil V.
Publication year - 1994
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1994.tb07122.x
Subject(s) - electrochemistry , deposition (geology) , materials science , substrate (aquarium) , chemical vapor deposition , doping , chemical engineering , analytical chemistry (journal) , nanotechnology , chemistry , electrode , optoelectronics , chromatography , paleontology , sediment , engineering , geology , oceanography , biology
Electrochemical liquid deposition (ELD) has been used to grow fully dense films of ceria on impervious gadolinia‐doped ceria substrates of variable thickness. The process is similar to electrochemical vapor deposition (EVD) except that a liquid is used instead of a vapor to provide precursor material to the growing film. ELD film growth data have been analyzed in a manner similar to that for EVD demonstrated previously. Experimental results verify that the pertinent rate equation is obeyed phenomenologically. Rate constants for the film (CeO 2 ) and the substrate (l‐l‐mol%‐Gd 2 O 3 ‐doped CeO 2 ) at 1200°C have been determined as K f = 33.1 × 10 −12 m 2 /s and K s = 51.6 × 10 −12 m 2 /s, respectively.